Electron beam exposure micro-nanofabrication technology

Author: Gu Wenqi, Editor-in-Chief
Publisher:
Publish Date: 2004-07-01
Features: This book systematically introduces the development history and principles of electron beam exposure technology, the composition and classification of systems, applications, and development prospects. It also provides detailed descriptions of the performance and technical specifications of various advanced electron beam exposure machines, as well as key components such as electron optical columns, precision workstations, mask plate fabrication, and direct electron beam writing. The book is divided into 10 chapters:
Chapter 1: Introduction to Electron Beam Exposure Technology;
Chapter 2: Electron Optical Systems in Electron Beam Exposure Machines;
Chapter 3: Workstation and Laser Interferometer Precision Positioning;
Chapter 4: Pattern Generator;
Chapter 5: Detection, Alignment, and Correction Technology;
Chapter 6: Computer Control Technology and Data Conversion for Electron Beam Exposure Machines;
Chapter 7: Electron Beam Exposure Plotting Art;
Chapter 8: Vacuum Control System;
Chapter 9: Introduction to Several Electron Beam Exposure Machines at Home and Abroad;
Chapter 10: Applications and Development Prospects of Electron Beam Exposure Technology.
This book can serve as a technical reference for scientists and engineers in the field of microelectronics, as well as those working in microelectronics, micro-optics, micro-mechanics, and other micro/nano processing technology fields. It is also suitable as a reference for professional teachers and graduate students in universities.