Principle and Application of Soft X-ray and Extreme Ultraviolet Radiation

Author: Atwood
Publisher:
Publish Date: 2003-09-01
Features: This book also provides a wealth of useful references, such as data on electronic binding energies, characteristic emission lines, and light absorption cross-sections. It is highly valuable for graduate students and professionals working in fields such as engineering, physics, chemistry, and life sciences. Additionally, it is an indispensable reference for engineers engaged in semiconductor preparation and materials science. This self-contained comprehensive textbook primarily introduces the fundamental properties of soft X-ray and extreme ultraviolet (EUV) radiation, discussing its wide-ranging applications in various fields, including EUV lithography for semiconductor chip fabrication and soft X-ray microscopy for biological samples. Starting with an explanation of fundamental principles related to radiation, scattering, wave propagation, diffraction, and coherence, the book then explores numerous phenomena and applications associated with soft X-ray and EUV radiation. To cater to as many readers as possible, each chapter begins with a summary of important results and concepts, followed by an introduction with minimal mathematical formulas, and then a detailed mathematical derivation of the discussed topics. The content covers EUV lithography, biological microscopy, spectroscopic microscopy, EUV astronomy, synchrotron radiation, high-temperature and high-density plasma physics, and soft X-ray lasers.