Author: Guan Xudong
Publisher:
Publish Date: 2005-10-11
Features: This book systematically explains the fundamental processes in silicon integrated circuit manufacturing, with a focus on the physical principles and basic concepts. The book consists of ten chapters, where the first chapter briefly introduces the crystal structure of silicon, and chapters 2 to 9 respectively describe the basic single-process steps in silicon integrated circuit manufacturing, including oxidation, diffusion, ion implantation, physical vapor deposition, chemical vapor deposition, epitaxy, lithography and etching, metallization, and multi-layer interconnection. The final chapter covers process integration. This book can serve as a textbook or reference for undergraduate and graduate students in microelectronics at universities, as well as for process technicians engaged in integrated circuit manufacturing.
Fundamentals of Silicon Integrated Circuit Processing
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