Micro/Nano Machining Technology and Its Applications

Author: Cui Zheng
Publisher:
Publish Date: 2005-06-01
Features: This book aims to comprehensively introduce the recent advancements in micro-nano processing technologies. The book is divided into 8 chapters, with a focus on key micro-nano processing technologies, specifically micro-nano lithography, which includes optical exposure processing, electron beam exposure processing, focused ion beam processing, micro-nano pattern transfer technology, and micro-nano pattern replication technology. It emphasizes the characteristics, typical equipment, key process technologies, comparisons with similar technologies, recent developments, and future trends of these technologies. The explanations are based on literature published internationally in recent years, including the author's research achievements and experiences in this field over the past decade. Each technology is introduced with a clear explanation of its fundamental concepts. The book does not focus on complex theories but rather on explaining the problems encountered in practical applications and their solutions. The final chapter of the book covers the applications of micro-nano processing technologies, including current hot high-tech fields such as micro-nano electronics, high-density magnetic storage, micro-electro-mechanical systems (MEMS), and biochips and nanotechnology. It highlights the key roles of micro-nano processing technologies in these fields. Detailed references are provided at the end of each chapter. The book also includes a Chinese-English name glossary and index at the end, providing readers with convenient access to foreign literature for further reference. The target readers of this book include senior graduate students, university teachers, scientists and engineers engaged in microelectronics processing, microsystem technology, and nanotechnology, as well as professionals working in microelectronics processing technology and ultra-large-scale integrated circuit (ULSI) processing technology.
This book combines the author's years of practical experience and research achievements to systematically introduce the fundamentals of micro-nano processing technologies, including optical exposure technology, electron beam exposure technology, focused ion beam processing technology, X-ray exposure technology, various etching technologies, and micro-nano-scale replication technology. It clearly explains the principles of each processing technology, lists basic process steps, explains the origins of various process conditions, and provides typical process parameters. It thoroughly analyzes the advantages and disadvantages of each technology and the precautions to be taken during application. The book emphasizes practicality, avoiding tedious mathematical analysis, while focusing on fundamental knowledge and incorporating the latest advancements in micro-nano processing technologies and their applications in various high-tech fields. Relevant references are also provided for further in-depth study. Therefore, whether for undergraduate and graduate students who are new to this field or for professional scientists and engineers with some working experience, the book serves as a valuable reference.