Author: Shi Meitai
Publisher:
Publish Date: 2003-12-01
Features: The layout methods introduced in this book mostly have characteristics such as double-layer overlap, single-layer symmetry, consistent direction, straight yarn alignment, and rational splicing. These methods ensure the quality of garment pieces, save material, and speed up cutting. The book is divided into four major categories: Layout Basics, Women's Garment Layout, Men's Garment Layout, and Pattern Cutting Layout. It includes nearly 400 layout diagrams. The content is comprehensive and practical, with precise and reasonable layout designs, making it easy to consult. For all basic types of clothing, a variety of widths and complete specifications are provided, while also including a large number of new-style items. This allows readers to not only master the layout methods of basic items but also apply them flexibly to adapt to the ever-changing trends in clothing styles.
Fashion precise cutting
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