Photoelastic Patch Technology and Engineering Applications

Author: Yan Cheng'ai
Publisher:
Publish Date: 2003-07-01
Features: The book elaborates on its content in an accessible manner, closely integrating theory with practical applications, making it a reference for undergraduate and graduate students in relevant fields of higher education, as well as for engineering technicians. This book summarizes the author's extensive research achievements in the field of engineering photo-pasting technology over the years. It systematically introduces the relevant theories and technical characteristics of photo-pasting, including the necessary mechanics and optical fundamentals, the basic principles and features of photo-pasting, photo-pasting materials and fabrication techniques, adhesives, the design of measurement devices, information acquisition and processing, and concludes with examples of stress and strain testing in fields such as mechanical engineering, aerospace, and nuclear energy.